Citation: "His invention of Al-Cu thin film conductors is widely used in modern computers without which their life would be shortened significantly due to electromigration failures. He has also done seminal work on metal silicide solid state reactions for applications in computers."
Biography: Francois M. d'Heurle is an emeritus research staff member for IBM Research and holds an adjunct professorship at the Royal Institute of Technology in Stockholm, Sweden. He earned his B.S. in mechanical engineering at Arts et Metiers in 1946, his M.S. in metallurgical engineering at Michigan Technological University in 1948, and his Ph.D. in metallurgical engineering at the Illinois Institute for Technology in 1958. He served in a number of managerial and scientific positions at IBM during his 35 year career.
Dr. d'Heurle has authored or coauthored more than 200 technical papers on thin films, electromigration, diffusion, solid-state reactions, nucleation, and oxidation. He is a member of the editorial board for Thin Solid Films and Defect and Diffusion Forum. He has received several awards.
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