See what’s happening now in materials discovery and development! Join a discussion with experts from ZEISS Microscopy and Oak Ridge National Laboratory (ORNL) to understand the latest advances in electron and x-ray microscopy.
Will Harris, ZEISS Microscopy, will present the challenges of developing new materials, and will focus on microscopy as a cornerstone characterization method and introduce several techniques that, when used in conjunction, can help researchers understand material problems that span length scales, dimensions, and modalities. Ryan Dehoff, ORNL, will present case studies where these and similar approaches are being put into action, with the overarching theme of addressing challenges related to additive manufactured parts. Learn how your organization can coordinate imaging techniques and data processing to better understand the processing-structure-property connections that exist in these materials.