Application of Atomic Layer Deposition for Functional Nanomaterials
Manuscript Submission Deadline:
July 01, 2018
Publication Date: December 2018
Keywords: Advanced Materials,Composites,Electronic Materials,Energy,Mechanical Properties,Nanotechnology,Physical Properties,Polymers,Thin Films and Interfaces
Scope: Atomic layer deposition (ALD), an advanced thin film coating method used to fabricate ultrathin, highly uniform and conformal material layers, is increasingly finding unique uses in generating functional nanomaterials. The theme will cover the recent advances in ALD for fabricating functional nanomaterials having novel material properties and technological applications.
Call for Papers